The DUV-250 Microscope incorporates deep ultraviolet, optics, illumination, and imaging technology that makes possible the visualization of critical sub-micron features in both leading edge and future generation integrated circuits.

The high magnification of this unique microscope creates a simple and quick way to check sub-micron semiconductor processing at critical steps without any sample preparation. The DUV-250 microscope provides quick, easy, and meaningful visualization of the sub-micron world.  The DUV-250 microscope fills a gap between visible light microscopy and scanning electron microscopy. Critical sub-micron level electron beam generated photomasks can be inspected after resist development for sub-micron feature compliance prior to etch.

The DUV-250 Microscope Operating at 25,000x magnification produces useful images of .18 microns and below.  Pictured in front are two polysilicon conductors .18 microns in width.  The sub-micron image of the poly lines is seen through a passivation layer of silicon dioxide.